Editorial Policies
Aims and Scope
Journal is covers technological, physical and circuit engineering problems in micro- and nanoelectronics. Special emphasis on new trends in lithography (optical, x-ray, electron, ion), etching, impurity implantation, deposition and planarization in submicron and nanometer scale.
Sections
ДИАГНОСТИКА
КВАНТОВЫЕ ТЕХНОЛОГИИ
МОДЕЛИРОВАНИЕ
ТЕХНОЛОГИИ
ИСКУССТВЕННЫЙ ИНТЕЛЛЕКТ
МОДЕЛИРОВАНИЕ ПРИБОРОВ
МОДЕЛИРОВАНИЕ ТЕХНОЛОГИЧЕСКИХ ПРОЦЕССОВ
ЛИТОГРАФИЯ
ПРИБОРЫ
ТЕХНОЛОГИЯ
МЭМС–УСТРОЙСТВА
УСТРОЙСТВА
МОДЕЛИРОВАНИЕ ТЕХНОЛОГИЧЕСКИХ ПРОЦЕССОВ
НАДЕЖНОСТЬ
ПЛАЗМЕННЫЕ ТЕХНОЛОГИИ
ПАМЯТЬ
СЕНСОРЫ
МЭМС-УСТРОЙСТВА
NEUROMORPHIC SYSTEMS
NANOSTRUCTURES
NANOTRANSISTORS
Publication Frequency
Periodicity: 6 issues a year.
Issue Purchase
Readers without a subscription may still purchase individual issues. The following payment options and fees are available.
Access for an Issue: 129.00 (USD)
You can purchase the access for all articles published in one issue. Access to articles will be provide for an unlimited time.
Access to issue allows you to read, download and print full text (PDF and HTML) of all articles, but does not allow to distribute, copy or reproduce articles materials until the end of the embargo period (3 years) since the publication of the article).
Article Purchase
Readers without a subscription may still purchase individual articles. The following payment options and fees are available.
Access for an Article: 16.00 (USD)
You can purchase the access for the article to read, download and print its fulltext (PDF, HTML). Access to article will be provide for an unlimited time.
Purchased access does not allow to distribute, copy or reproduce article's materials until the end of the embargo period (3 years) since the publication of the article).
Indexing
Indexing:
- RSCI
- translated version in Scopus
- VAK