Production of ferroelectric hafnium oxide films by magnetron sputtering
- Authors: Luzanov V.A.1
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Affiliations:
- Fryazino Branch Kotelnikov Institute of Radioengineering and Electronics of RAS
- Issue: Vol 69, No 10 (2024)
- Pages: 1000-1003
- Section: НАНОЭЛЕКТРОНИКА
- URL: https://rjsvd.com/0033-8494/article/view/684753
- DOI: https://doi.org/10.31857/S0033849424100106
- EDN: https://elibrary.ru/HPSBDR
- ID: 684753
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