The Franz-Keldysh effect in silicon–ultrathin (3.7 nm) oxide–polysilicon structures
- Authors: Belorusov D.A.1, Goldman E.I.1, Chucheva G.V.1
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Affiliations:
- Kotelnikov Institute of Radioengineering and Electronics, Russian Academy of Sciences, Fryazino Branch
- Issue: Vol 68, No 9 (2023)
- Pages: 917-920
- Section: К 70-ЛЕТИЮ ИРЭ ИМ. В.А. КОТЕЛЬНИКОВА РАН
- URL: https://rjsvd.com/0033-8494/article/view/650476
- DOI: https://doi.org/10.31857/S0033849423090036
- EDN: https://elibrary.ru/SBHPRG
- ID: 650476
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