Selecting a target for obtaining films of higher manganese silicide using magnetron sputtering
- Authors: Lukasov M.S.1, Arkharova N.A.1, Orekhov A.S.1, Kamilov T.S.2, Klechkovskaya V.V.1
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Affiliations:
- Shubnikov Institute of Crystallography of Kurchatov Complex of Crystallography and Photonics of NRC "Kurchatov Institute"
- Tashkent State Technical University named after Islam Karimov
- Issue: Vol 69, No 3 (2024)
- Pages: 487-493
- Section: ПОВЕРХНОСТЬ, ТОНКИЕ ПЛЕНКИ
- URL: https://rjsvd.com/0023-4761/article/view/673189
- DOI: https://doi.org/10.31857/S0023476124030144
- EDN: https://elibrary.ru/XOCJCW
- ID: 673189
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