Amorphous SICX:H and SICXNY:H films obtained from hexamethyldisilane vapor in inductively coupled RF discharge plasma
- Authors: Chagin M.N.1, Ermakova E.N.1, Shayapov V.R.1, Sulyaeva V.S.1, Maksimovskii E.A.1, Yushina I.V.1, Kosinova M.L.1
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Affiliations:
- Nikolaev Institute of Inorganic Chemistry, Siberian Branch, Russian Academy of Sciences
- Issue: Vol 58, No 6 (2024)
- Pages: 500-507
- Section: PLASMA CHEMISTRY
- URL: https://rjsvd.com/0023-1193/article/view/681218
- DOI: https://doi.org/10.31857/S0023119324060112
- EDN: https://elibrary.ru/THFVPG
- ID: 681218
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