Plasma-Enhanced Chemical Vapor Deposition of Thin GaS Films on Various Types of Substrates
- Authors: Kudryashov M.A.1,2, Mochalov L.A.1,2, Prokhorov I.O.1,2, Vshivtsev M.A.1, Kudryashova Y.P.2, Malyshev V.M.1, Slapovskaya E.A.2
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Affiliations:
- Nizhny Novgorod State Technical University
- Lobachevsky State University of Nizhny Novgorod
- Issue: Vol 57, No 6 (2023)
- Pages: 495-499
- Section: PLASMA CHEMISTRY
- URL: https://rjsvd.com/0023-1193/article/view/661470
- DOI: https://doi.org/10.31857/S0023119323060098
- EDN: https://elibrary.ru/RULDFW
- ID: 661470
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